发明名称 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
摘要 |
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity. |
申请公布号 |
US9224576(B2) |
申请公布日期 |
2015.12.29 |
申请号 |
US201414165573 |
申请日期 |
2014.01.27 |
申请人 |
CARL ZEISS MICROSCOPY GMBH;APPLIED MATERIALS ISRAEL, LTD. |
发明人 |
Knippelmeyer Rainer;Kienzle Oliver;Kemen Thomas;Mueller Heiko;Uhlemann Stephan;Haider Maximilian;Casares Antonio;Rogers Steven |
分类号 |
G21K5/10;H01J37/08;H01J37/30;B82Y10/00;B82Y40/00;H01J37/09;H01J37/28;H01J37/317;H01J37/14;H01J37/10 |
主分类号 |
G21K5/10 |
代理机构 |
Morris & Kamlay LLP |
代理人 |
Morris & Kamlay LLP |
主权项 |
1. A particle-optical arrangement comprising:
at least one charged-particle source for generating at least one beam of charged particles; at least one multi-aperture plate arranged in a beam path of the at least one beam of charged particles, wherein the at least one multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the at least one beam of charged particles downstream of the multiaperture plate, and wherein a plurality of beam spots is formed in an image plane of the particle-optical arrangement by the plurality of charged-particle beamlets; and wherein a shape of at least one group of the apertures is an elliptical shape. |
地址 |
Oberkochen DE |