发明名称 Process for forming expanded hexagonal layered minerals and derivatives using electrochemical charging
摘要 Processes for forming expanded hexagonal layered minerals (HLMs) and derivatives thereof using electrochemical charging are disclosed. The process includes employing HLM rocks (20) as electrodes (100) immersed in an electrolytic slurry (50) that includes an organic solvent, metal ions and expanded HLM (24). The electrolysis introduces organic solvent and ions from the metal salt from the slurry into the interlayer spacings that separate the atomic interlayers of the HLM rock, thereby forming 1st-stage charged HLM that exfoliates from the HLM rock. The process includes expanding the electrochemically 1st-stage charged HLM by applying an expanding force.
申请公布号 US9221687(B2) 申请公布日期 2015.12.29
申请号 US201214009800 申请日期 2012.11.22
申请人 National University of Singapore 发明人 Loh Kian Ping;Wang Junzhong;Chiu Gordon
分类号 C01B31/04;B82Y40/00;C25B1/00;C01B21/064;C01B19/00;C01G31/02;C01G39/06;C01G41/00;B82Y30/00;H01M4/583;H01M4/587 主分类号 C01B31/04
代理机构 Opticus IP Law PLLC 代理人 Opticus IP Law PLLC
主权项 1. A process of forming an expanded hexagonal layered mineral (HLM), comprising: immersing at least a portion of an HLM rock in a slurry constituted by a mixture of expanded HLM rock, a metal salt and an organic solvent, with the slurry having the following composition: HLM rock: 15-20 wt %; HLM flake: 0.1-5 wt %; and an electrolyte of 80-160 g/L of LiClO4 (5-10 wt %) in propylene carbonate: 70-80 wt %; wherein the HLM rock has atomic interlayers each having an hexagonal lattice structure, with the atomic interlayers separated by interlayer spacings; electrochemically charging the HLM rock by incorporating the HLM rock into at least one electrode and performing electrolysis through the slurry using the at least one electrode, thereby introducing the organic solvent and ions from the metal salt from the slurry into the interlayer spacings of the HLM rock to form 1st-stage charged HLM that exfoliates from the HLM rock; and expanding the 1st-stage charged HLM by applying an expanding force to increase the interlayer spacings between the atomic layers.
地址 Singapore SG