| 摘要 |
An exposure apparatus exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting the image of a pattern onto the substrate through the projection optical system and the liquid, and includes a liquid removing mechanism that intermittently blows a gas against a reference member, movable mirror, and the like, to which the liquid is adhered in order to remove that liquid. |
| 主权项 |
1. An exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting an image of a pattern onto the substrate through the projection optical system and the liquid, the apparatus comprising:
a liquid supply system having a supply port from which the liquid is supplied, an optical path between a lower end surface of the projection optical system and an upper surface of the substrate being filled with the liquid of a liquid immersion area, and less than an entirety of the upper surface of the substrate being covered by the liquid supplied from the supply port during exposure of the substrate, the liquid immersion area being moved relative to the substrate during the exposure; a component which is moved to a position in a vicinity of an image plane of the projection optical system; a shield member that prevents an adherence of the liquid to the component, the shield member being provided directly over the component and protruding laterally beyond an upper surface of the component in a direction radially outward of the component with respect to a holder portion that holds the substrate, the shield member being provided below the lower end surface of the projection optical system, and the shield member having an upper surface, the upper surface of the shield member being liquid repellent with respect to the liquid; and an auxiliary plate provided on a substrate holding member, which includes the holder portion, the auxiliary plate having an upper surface, the upper surface of the auxiliary plate being coplanar with the upper surface of the shield member, wherein
the liquid of the liquid immersion area is capable of being located on the shield member, andthe auxiliary plate surrounds the substrate and is located between the substrate and the shield member when the substrate is held on the substrate holding member by the holder portion. |
