发明名称 APPARATUS FOR TREATMENTING SUBSTRATE
摘要 A flange unit according to the present invention includes: a flange body which supports a tube by being located on one side of the tube treating a substrate therein, is hollow to have an empty space communicating with an internal space of the tube, and has a groove formed in a lateral direction of the empty space along an outer surface thereof; an upper heating element which is embedded in an upper side of the groove in the flange body, and heats the flange body; and a lower heating element which is embedded in a position of a lower side of the groove in the flange body, and heats the flange body. Therefore, according to the embodiments of the present invention, the flange body can be uniformly heated. On the other hand, according to a convention manner, a plurality of block-shaped heating elements are inserted into a groove of a flange body. Since a contact area between the heating elements and the flange body is not even, the temperature of the flange body is not uniform, which causes a problem that powder is adhered and fixated to an inner wall of the flange. On the contrary, according to the present invention, an inner side of the flange body can be uniformly heated, in comparison with the previous method, by burying a line-shaped heating element in the flange body which is an upper body and a lower body, thus the present invention can more effectively prevent powder from being adhered and fixated in comparison with the previous method.
申请公布号 KR101577324(B1) 申请公布日期 2015.12.29
申请号 KR20140074190 申请日期 2014.06.18
申请人 THERMTECS CO., LTD. 发明人 CHO, MIN CHUL;KIM, KYUNG MIN
分类号 H01L21/22;H01L21/02;H01L21/324 主分类号 H01L21/22
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