| 摘要 |
The present invention relates to a method for manufacturing a photo-functional pattern structure. The method includes the following steps: forming a preparatory planar layer to cover a sacrificial pattern on an object after forming the sacrificial pattern on the object; and selectively removing the sacrificial pattern from the object and changing the preparatory planer layer into a lower photo-functional pattern, on which hollow holes corresponding to the sacrificial pattern are formed, and an upper planar layer, individually. |
