APPARATUS TREATING A SUBSTRATE AND METHOD CLEANING THE APPARATUS

摘要

The present invention relates to a substrate treatment apparatus. In an apparatus for treating a substrate for treatment, the substrate treatment apparatus according to an embodiment of the present invention includes: a cup having a treatment space; a support unit for supporting the substrate for treatment in the treatment space; a liquid supply unit for supplying a liquid to the substrate for treatment supported by the support unit; and a controller for controlling the support unit and the liquid supply unit. The controller controls the support unit and the liquid supply unit to perform: a first cleaning step of supplying a first cleaning liquid from the liquid supply unit toward the substrate for cleaning and cleaning the cup by rotating the support unit at the same time while the the substrate for cleaning is placed on the support unit; and a second cleaning step of supplying a second cleaning liquid from the liquid supply unit toward the substrate for cleaning and cleaning the cup and the support unit by rotating the support unit at the same time while the substrate for cleaning is removed from the support unit.