| 摘要 |
The present invention relates to a plasma cleaning apparatus for a semiconductor, to clean a semiconductor component through plasma discharge during a semiconductor manufacturing process, and more specifically, to a plasma cleaning apparatus for a semiconductor, to perform loading of a semiconductor component which is a cleaning target and is accommodated in a magazine through a rotary stage, and unloading of the semiconductor component whose cleaning is completed, on the same magazine in a single place. The plasma cleaning apparatus for the semiconductor according to the present invention includes: a magazine table (100) for elevating a magazine (M) loaded with a number of semiconductor components (A) with a fixed gap step by step according to a cleaning proceeding state; a rotary stage (200) which rotates horizontally as being installed in a rear of the magazine table; a plasma cleaning chamber (300) which cleans the semiconductor components supplied to the rotary stage by descending toward the rotary stage; a first transport member (400) which moves the semiconductor component, the cleaning target, by pushing the semiconductor component backward whenever the magazine is elevated step by step, by being located in front of the magazine table; a second transport member (500) which is installed on an upper part of the rotary stage as being able to ascend/descend and move forward/backward, and supplies the semiconductor component, the cleaning target, moved backward through the first transport member to the rotary stage by picking up the semiconductor component, or loads the cleaned semiconductor component placed on the upper part of the rotary stage on the magazine step by step by pushing the cleaned semiconductor component toward the magazine table; and a bridge rail (600) which is installed between the rotary stage and the magazine table, and provides clearance for the rotation to the rotary stage by ascending when the rotary stage is rotated. |
