APPARATUS FOR DRYING SUBSTRATE

摘要

An apparatus for drying a substrate comprises: a first substrate drying unit disposed above a substrate to spray high pressure air to an upper surface of the substrate; and a second substrate drying unit disposed below the substrate to spray the high pressure air to a lower surface of the substrate. The first substrate drying unit comprises: a first housing; a first nozzle connected to a lower portion of the first housing to spray the high pressure air to the upper surface of the substrate; a vaporization unit arranged in a prescribed area of a lower portion of a front surface of the first housing facing a transport direction of the substrate and protruded in an opposite direction to the transport direction of the substrate; and a heater unit to heat the vaporization unit.