| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device which prevents a substrate from deforming into a warped shape when the substrate is cleaned by using an oscillation cleaning member.SOLUTION: A substrate cleaning device includes: outer periphery support members 32 which support an outer periphery of a rotating substrate W; an oscillation cleaning member 34 which oscillates between a first outer periphery position B and a second outer periphery position B' of the substrate W while passing through a center part A of the substrate W and cleans a surface of the rotating substrate W; and a long support member 36 which extends in a long shape from a third outer periphery position C to a fourth outer periphery position C' of the substrate W so as to pass through the center part A of the substrate W and supports a rear surface of the rotating substrate W. The first outer periphery position B is positioned between a position D of the outer periphery support member 32 of the multiple outer periphery support members 32, which is closest to the third outer periphery position C, and the third outer periphery position C. |
