CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition that can give a pattern having extremely high resolution and a small degree of LER.SOLUTION: The chemically amplified resist composition comprises: a sulfonium salt represented by formula (1); and a polymeric compound having a repeating unit represented by formula (U-1), which is decomposed by an action of an acid to increase solubility in an alkali developer.