发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 In a semiconductor device, a first conductivity-type first semiconductor region that abuts on a side surface of a contact trench adjacent to an opening portion of the contact trench, and has a higher impurity concentration than that of a second semiconductor layer is formed. Also, a second conductivity-type second semiconductor region that abuts on a bottom surface of the contact trench and a side surface of the contact trench adjacent to the bottom surface of the contact trench, and has a higher impurity concentration than that of a first semiconductor layer is formed. A first electrode that is connected electrically with the first semiconductor region and the second semiconductor region is disposed in the contact trench. Even when the semiconductor device is miniaturized by reducing the width of the contact trench, a breakage of the semiconductor device when switched from an on-state to an off-state is reduced.
申请公布号 US2015372090(A1) 申请公布日期 2015.12.24
申请号 US201314759823 申请日期 2013.12.23
申请人 DENSO CORPORATION 发明人 OOSAWA Seigo;TOMATSU Yutaka;OGINO Masahiro;OOBAYASHI Tomomi
分类号 H01L29/10;H01L29/66;H01L29/78 主分类号 H01L29/10
代理机构 代理人
主权项 1. A semiconductor device comprising: a first conductivity-type drift layer; a second conductivity-type first semiconductor layer disposed in a surface layer portion of the drift layer; a first conductivity-type second semiconductor layer disposed in a surface layer portion of the first semiconductor layer; a contact trench disposed in the second semiconductor layer; a first conductivity-type first semiconductor region abutting on a side surface of the contact trench adjacent to an opening portion of the contact trench and having a higher impurity concentration than that of the second semiconductor layer; a second conductivity-type second semiconductor region abutting on a bottom surface of the contact trench and a side surface of the contact trench adjacent to the bottom surface of the contact trench and having a higher impurity concentration than that of the first semiconductor layer; a first electrode disposed in the contact trench and connected electrically with the first semiconductor region and the second semiconductor region; and a second electrode connected electrically with a region different from a region to which the first electrode is electrically connected and allowing a current to flow between the first electrode and the second electrode.
地址 Kariya-city, Aichi JP