| 发明名称 |
Substrate Processing System, Gate Valve and Substrate Transfer Method |
| 摘要 |
There is provided a substrate processing system which includes: at least two transfer chambers disposed adjacent each other, each of which including a transfer mechanism configured to transfer a substrate; at least one process chamber connected to each of the at least two transfer chambers, and configured to perform a process on the substrate loaded into the at least one process chamber; a gate valve configured to move into and out of a connection path interconnecting the at least two transfer chambers and configured to separate the at least two transfer chambers from each other; and a substrate holding mechanism attached to the gate valve and configured to hold the substrate. |
| 申请公布号 |
US2015371812(A1) |
申请公布日期 |
2015.12.24 |
| 申请号 |
US201514735216 |
申请日期 |
2015.06.10 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MAEDA Kouji;SUZUKI Naoyuki;MIYASHITA Tetsuya;HARA Masamichi |
| 分类号 |
H01J37/18;H01J37/32 |
主分类号 |
H01J37/18 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing system, comprising:
at least two transfer chambers disposed adjacent each other, each of which including a transfer mechanism configured to transfer a substrate; at least one process chamber connected to each of the at least two transfer chambers, and configured to perform a process on the substrate loaded into the at least one process chamber; a gate valve configured to move into and out of a connection path interconnecting the at least two transfer chambers and configured to separate the at least two transfer chambers from each other; and a substrate holding mechanism attached to the gate valve and configured to hold the substrate. |
| 地址 |
Tokyo JP |
