| 摘要 |
PROBLEM TO BE SOLVED: To drive a stage for holding a substrate in an exposure operation, with good accuracy.SOLUTION: The drive of a stage WST by a drive system is controlled by a controller on the basis of information for compensation of measurement errors of an encoder system (Y head 64 and X head 66) due to Y scales 39Yand 39Yand X scales 39Xand 39Xand positional information measured by the encoder system. In an exposure operation of exposing a wafer to illumination light through a projection optic system and a liquid of the liquid immersion region, the positional information of the stage is measured by the encoder system. |
