| 发明名称 |
SURFACE PROCESSING APPARATUS |
| 摘要 |
A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A. |
| 申请公布号 |
US2015371813(A1) |
申请公布日期 |
2015.12.24 |
| 申请号 |
US201514747488 |
申请日期 |
2015.06.23 |
| 申请人 |
EBARA CORPORATION |
发明人 |
HATAKEYAMA Masahiro;SUEMATSU Kenichi;TAJIMA Ryo;TSUKAMOTO Kiwamu;TERAO Kenji;YOSHIKAWA Shoji |
| 分类号 |
H01J37/20;H01J37/305;H01J37/22;H01J37/073;H01J37/10 |
主分类号 |
H01J37/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A surface processing apparatus which performs surface processing on an inspection object by irradiating the inspection object with an electron beam, comprising:
an electron source which generates the electron beam; a lens system which controls a beam shape of the electron beam; a stage on which the inspection object to be irradiated with the electron beam is set; and an optical microscope for checking a position to be irradiated with the electron beam, wherein a current value of the electron beam which irradiates the inspection object is set at 10 nA to 100 A. |
| 地址 |
Tokyo JP |
