发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a first nitride semiconductor layer including carbon and having a first side and an opposing second side. The semiconductor device further includes an intrinsic nitride semiconductor layer on the first nitride semiconductor layer. A first side of the intrinsic semiconductor layer faces the second side of the first nitride semiconductor layer. The semiconductor device further includes a second nitride semiconductor layer including aluminum and disposed on a second side of the intrinsic nitride semiconductor layer opposite to the first nitride semiconductor layer. The first nitride semiconductor layer has a carbon distribution in which a concentration of carbon changes between a high concentration region and a low concentration region. In some embodiments, the high concentration region has a carbon concentration at least 100 times higher than the carbon concentration in the low concentration region.
申请公布号 US2015372124(A1) 申请公布日期 2015.12.24
申请号 US201514634863 申请日期 2015.03.01
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ISOBE Yasuhiro;SUGIYAMA Naoharu
分类号 H01L29/778;H01L29/36;H01L29/20 主分类号 H01L29/778
代理机构 代理人
主权项 1. A semiconductor device, comprising: a first nitride semiconductor layer containing carbon, the first nitride semiconductor layer having a first side opposite a second side; an intrinsic nitride semiconductor layer on the first side of the first nitride semiconductor layer; and a second nitride semiconductor layer on the intrinsic nitride semiconductor layer opposite to the first nitride semiconductor layer and including aluminum, wherein the first nitride semiconductor layer has a carbon distribution along a thickness direction from the second side to the first side in which a concentration of carbon changes from a high concentration region to a low concentration region.
地址 Tokyo JP