发明名称 |
PLASMA APPARATUS AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
A plasma generating apparatus includes peripheral dielectric tubes arranged at regular intervals around a circumference having a constant radius from the center of top surface of a chamber, peripheral antennas disposed to cover the peripheral dielectric tubes, upper magnets vertically spaced apart from the peripheral dielectric tubes to be disposed on the same first plane, and lower magnets each being disposed on the same second plane between the upper magnets and the peripheral dielectric tubes. A central axis of the upper magnets and a central axis of the lower magnets match each other, and plasma is generated inside the peripheral dielectric tubes. |
申请公布号 |
US2015371823(A1) |
申请公布日期 |
2015.12.24 |
申请号 |
US201514747657 |
申请日期 |
2015.06.23 |
申请人 |
Wintel Co., Ltd. |
发明人 |
Eom Sung-Hwan;Lee Kee-Su |
分类号 |
H01J37/32;C23C16/505 |
主分类号 |
H01J37/32 |
代理机构 |
|
代理人 |
|
主权项 |
1. A plasma generating apparatus comprising:
peripheral dielectric tubes arranged at regular intervals around a circumference having a constant radius from the center of top surface of a chamber; peripheral antennas disposed to cover the peripheral dielectric tubes; upper magnets vertically spaced apart from the peripheral dielectric tubes to be disposed on the same first plane; and lower magnets each being disposed on the same second plane between the upper magnets and the peripheral dielectric tubes, wherein a central axis of the upper magnet and a central axis of the lower magnet match each other, and plasma is generated inside the peripheral dielectric tubes. |
地址 |
Gyeonggi-do KR |