发明名称 LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
摘要 The present invention prevents the shaving of an alignment film caused by a columnar spacer in a liquid crystal display device of an IPS method using photo-alignment. A plinth higher than a pixel electrode is formed at a part where a columnar spacer formed over a counter substrate touches a TFT substrate. When an alignment film of a double-layered structure is applied over the pixel electrode and the plinth, the thickness of the alignment film over the plinth reduces by a leveling effect. When photo-alignment is applied in the state, a photodegraded upper alignment film over the plinth disappears and a lower alignment film having a high mechanical strength remains. As a result, it is possible to prevent the shaving of the alignment film.
申请公布号 US2015370102(A1) 申请公布日期 2015.12.24
申请号 US201514840604 申请日期 2015.08.31
申请人 Japan Display Inc. 发明人 KUNIMATSU Noboru;MATSUMORI Masaki;SONODA Hidehiro;TOMIOKA Yasushi;KANEKO Toshiki
分类号 G02F1/1337;G02F1/1339;G02F1/1333;G02F1/1368;G02F1/1362 主分类号 G02F1/1337
代理机构 代理人
主权项 1. A liquid crystal display device comprising: a TFT substrate and a counter substrate; a liquid crystal layer disposed between the TFT substrate and the counter substrate; a plurality of scanning lines and a plurality of signal lines formed on the TFT substrate; a first insulation film formed above the plurality of scanning lines, the plurality of signal lines, and the TFT substrate; a first electrode formed on the first insulation film; a second insulation film formed on the first insulation film and the first electrode; a second electrode formed on the second insulation film; and an alignment film formed on the second electrode and the second insulation film, wherein the liquid crystal layer is driven by an electric field generated between the first electrode and the second electrode, wherein the second insulation film has a first portion disposed above the plurality of scanning lines or the plurality of signal lines; a distance from the TFT substrate to an upper surface of the second insulation film at the first portion is greater than a distance from the TFT substrate to an upper surface of the second electrode, wherein the alignment film comprises a first part subject to photo-alignment treatment formed by a first precursor, wherein the alignment film comprises a second part on the second electrode formed by a second precursor, and wherein the second part is disposed between the second insulation film and the first part, when the thickness of the second part is defined as p1 and the thickness of the first part is defined as p2, p2/p1 over the first portion is smaller than p2/p1 over a second portion.
地址 Tokyo JP