发明名称 |
ANTI-REFLECTION FILM AND PRODUCTION METHOD THEREFOR |
摘要 |
An anti-reflection film according to the present invention includes: a substrate; and a medium-refractive index layer, a high-refractive index layer, and a low-refractive index layer in the stated order from a substrate side. When optical design of a reflection characteristic of the anti-reflection film is performed with a complex plane of a reflectance amplitude diagram at a wavelength of 580 nm, refractive indices and/or thicknesses of the substrate, the medium-refractive index layer, the high-refractive index layer, and the low-refractive index layer are designed in such a manner that a line AB connecting a starting point A and an ending point B of a lamination locus of the high-refractive index layer intersects a real axis of the reflectance amplitude diagram. |
申请公布号 |
US2015369966(A1) |
申请公布日期 |
2015.12.24 |
申请号 |
US201414763583 |
申请日期 |
2014.01.27 |
申请人 |
NITTO DENKO CORPORATION |
发明人 |
Kishi Atsushi;Ueno Tomonori;Kuramoto Hiroki |
分类号 |
G02B1/11;G02B5/30 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
1. An anti-reflection film, comprising:
a substrate; and a medium-refractive index layer, a high-refractive index layer, and a low-refractive index layer in the stated order from a substrate side, wherein when optical design of a reflection characteristic of the anti-reflection film is performed with a complex plane of a reflectance amplitude diagram at a wavelength of 580 nm, refractive indices and/or thicknesses of the substrate, the medium-refractive index layer, the high-refractive index layer, and the low-refractive index layer are designed in such a manner that a line AB connecting a starting point A and an ending point B of a lamination locus of the high-refractive index layer intersects a real axis of the reflectance amplitude diagram. |
地址 |
Ibaraki-shi, Osaka JP |