发明名称 ANTI-REFLECTION FILM AND PRODUCTION METHOD THEREFOR
摘要 An anti-reflection film according to the present invention includes: a substrate; and a medium-refractive index layer, a high-refractive index layer, and a low-refractive index layer in the stated order from a substrate side. When optical design of a reflection characteristic of the anti-reflection film is performed with a complex plane of a reflectance amplitude diagram at a wavelength of 580 nm, refractive indices and/or thicknesses of the substrate, the medium-refractive index layer, the high-refractive index layer, and the low-refractive index layer are designed in such a manner that a line AB connecting a starting point A and an ending point B of a lamination locus of the high-refractive index layer intersects a real axis of the reflectance amplitude diagram.
申请公布号 US2015369966(A1) 申请公布日期 2015.12.24
申请号 US201414763583 申请日期 2014.01.27
申请人 NITTO DENKO CORPORATION 发明人 Kishi Atsushi;Ueno Tomonori;Kuramoto Hiroki
分类号 G02B1/11;G02B5/30 主分类号 G02B1/11
代理机构 代理人
主权项 1. An anti-reflection film, comprising: a substrate; and a medium-refractive index layer, a high-refractive index layer, and a low-refractive index layer in the stated order from a substrate side, wherein when optical design of a reflection characteristic of the anti-reflection film is performed with a complex plane of a reflectance amplitude diagram at a wavelength of 580 nm, refractive indices and/or thicknesses of the substrate, the medium-refractive index layer, the high-refractive index layer, and the low-refractive index layer are designed in such a manner that a line AB connecting a starting point A and an ending point B of a lamination locus of the high-refractive index layer intersects a real axis of the reflectance amplitude diagram.
地址 Ibaraki-shi, Osaka JP