| 发明名称 |
ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE |
| 摘要 |
The present invention relates to an array substrate, a method for manufacturing the same and a display device. The array substrate comprises a substrate, and a first region and a second region that are provided on the substrate and adjacent to each other and a difference in level between the two exceeds a threshold, a difference-in-level compensation pattern is provided on the substrate, which overlaps with both the first region and the second region in a direction perpendicular to the substrate and does not exceed the first region and the second region. By the technical solution of the present invention, the difference in level between the data line and an adjacent region on the array substrate is reduced, so that during a rubbing process, the rubbing area of a polyimide solution is increased, and the risk of light leakage is reduced without a decrease of the pixel aperture ratio. |
| 申请公布号 |
US2015372014(A1) |
申请公布日期 |
2015.12.24 |
| 申请号 |
US201414525625 |
申请日期 |
2014.10.28 |
| 申请人 |
BOE TECHNOLOGY GROUP CO., LTD. ;CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
GAO SHAN |
| 分类号 |
H01L27/12;H01L29/423;H01L29/786 |
主分类号 |
H01L27/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An array substrate, comprising: a substrate, and a first region and a second region that are provided on the substrate and adjacent to each other, wherein a difference in level between the first region and the second region exceeds a threshold, a difference-in-level compensation pattern is provided on the substrate, and the difference-in-level compensation pattern overlaps with both the first region and the second region in a direction perpendicular to the substrate, and the difference-in-level compensation pattern does not exceed the first region and the second region. |
| 地址 |
BEIJING CN |
