SUBSTRATE PROCESSING APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a technique capable of improving manufacturing quality of a semiconductor device and improving manufacturing throughput.SOLUTION: The substrate processing apparatus includes: a processing container for accommodating a substrate; a first heating part for heating the substrate accommodated in the processing container; a gas generation part for generating a processing gas; a gas introduction pipe for introducing the processing gas into the processing container from the gas generating part; and a second heating part, disposed outside the processing container, for heating a connection part of the gas introduction part and the processing container.