发明名称 |
PRODUCTION METHOD OF NANO STRUCTURE THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a nano structure thin film capable of forming stably a nano-sized projection in a wide region.SOLUTION: In a production method of a nano structure thin film for forming a nano-sized projection on a substrate by sputtering, the nano-sized projection is formed stably in a wide region by performing sputtering in the state where the substrate is separated as far as 60 mm from a sputtering target. |
申请公布号 |
JP2015232165(A) |
申请公布日期 |
2015.12.24 |
申请号 |
JP20140119719 |
申请日期 |
2014.06.10 |
申请人 |
KOCHI PREFECTURAL PUBLIC UNIVERSITY CORP;SEKISUI CHEM CO LTD |
发明人 |
MURAKAMI JUNNOSUKE;YAMAMOTO NAOKI;MORISAWA KIRIHIKO |
分类号 |
C23C14/34;H01L31/0224;H01L31/18 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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