发明名称 PRODUCTION METHOD OF NANO STRUCTURE THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a production method of a nano structure thin film capable of forming stably a nano-sized projection in a wide region.SOLUTION: In a production method of a nano structure thin film for forming a nano-sized projection on a substrate by sputtering, the nano-sized projection is formed stably in a wide region by performing sputtering in the state where the substrate is separated as far as 60 mm from a sputtering target.
申请公布号 JP2015232165(A) 申请公布日期 2015.12.24
申请号 JP20140119719 申请日期 2014.06.10
申请人 KOCHI PREFECTURAL PUBLIC UNIVERSITY CORP;SEKISUI CHEM CO LTD 发明人 MURAKAMI JUNNOSUKE;YAMAMOTO NAOKI;MORISAWA KIRIHIKO
分类号 C23C14/34;H01L31/0224;H01L31/18 主分类号 C23C14/34
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