Image Mask Film Scheme and Method

摘要

A system and method for repairing a photolithographic mask is provided. An embodiment comprises forming a shielding layer over an absorbance layer on a substrate. Once the shielding layer is in place, the absorbance layer may be repaired using, e.g., an e-beam process to initiate a reaction to repair a defect in the absorbance layer, with the shielding layer being used to shield the remainder of the absorbance layer from undesirable etching during the repair process.

主权项

1. A photolithographic mask comprising:
a substrate; and an absorbance layer over the substrate, wherein the absorbance layer has an intensity profile less than about 0.66.