发明名称 PHOTOELECTRIC CONVERSION ELEMENT
摘要 A photoelectric conversion element includes a semiconductor, an intrinsic layer disposed on the semiconductor and containing hydrogenated amorphous silicon, a first-conductivity-type layer that covers a part of the intrinsic layer and contains hydrogenated amorphous silicon of a first conductivity type, a second-conductivity-type layer that covers a part of the intrinsic layer and contains hydrogenated amorphous silicon of a second conductivity type, an insulating film covering an end region of the first-conductivity-type layer, a first electrode disposed on the first-conductivity-type layer, and a second electrode disposed on the second-conductivity-type layer. An end portion of the second-conductivity-type layer is located on the insulating film or above the insulating film.
申请公布号 US2015372172(A1) 申请公布日期 2015.12.24
申请号 US201414762880 申请日期 2014.03.03
申请人 SHARP KABUSHIKI KAISHA 发明人 KIMOTO Kenji
分类号 H01L31/0224;H01L31/075;H01L31/0376 主分类号 H01L31/0224
代理机构 代理人
主权项 1. A photoelectric conversion element comprising: a semiconductor; an intrinsic layer disposed on the semiconductor and containing hydrogenated amorphous silicon; a first-conductivity-type layer that covers a part of the intrinsic layer and contains hydrogenated amorphous silicon of a first conductivity type; a second-conductivity-type layer that covers a part of the intrinsic layer and contains hydrogenated amorphous silicon of a second conductivity type; an insulating film covering an end region of the first-conductivity-type layer; a first electrode disposed on the first-conductivity-type layer; and a second electrode disposed on the second-conductivity-type layer, wherein an end portion of the second-conductivity-type layer is located on the insulating film or above the insulating film.
地址 Osaka-shi, Osaka JP