发明名称 |
METHOD FOR MANUFACTURING MOLYBDENUM OXIDE-CONTAINING THIN FILM |
摘要 |
Disclosed is a method for manufacturing a molybdenum oxide-containing thin film, involving vaporizing a starting material for forming a thin film containing a compound represented by the following general formula (I) to give vapor containing a molybdenum amide compound, introducing the obtained vapor onto a substrate, and further introducing an oxidizing gas to cause decomposition and/or a chemical reaction to form a thin film on the substrate. In the formula, R1 and R2 each represents a straight or branched alkyl group having 1 to 4 carbon atom(s), R3 represents a t-butyl group or a t-amyl group, y represents 0 or 2, x is 4 when y is 0, or x is 2 when y is 2, wherein R1 and R2 that are plurally present may be the same or different.; |
申请公布号 |
US2015371859(A1) |
申请公布日期 |
2015.12.24 |
申请号 |
US201514823293 |
申请日期 |
2015.08.11 |
申请人 |
ADEKA CORPORATION |
发明人 |
SATO Hiroki;UEYAMA Junji |
分类号 |
H01L21/28;H01L29/51;H01L29/49;H01L21/285;H01L21/768 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
|
主权项 |
1. A method for manufacturing a molybdenum oxide-containing thin film, comprising,
vaporizing a starting material for forming a thin film, the material comprising the compound No. 38:to obtain a vapor containing a molybdenum amide compound,
introducing the obtained vapor onto a substrate, and further introducing an oxidizing gas to cause decomposition and/or a chemical reaction to form a thin film on the substrate. |
地址 |
Tokyo JP |