发明名称 |
WIRING BOARD, SEMICONDUCTOR DEVICE AND WIRING BOARD MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a wiring board which can inhibit separation of an insulation layer but correspond to refinement of a wiring layer.SOLUTION: A wiring board 10 has a wiring structure 11 having an insulation layer 35 and via wiring 36, and a wiring structure 12 laminated on a top face of the wiring structure 11. The wiring structure 12 has a wiring layer 50 formed on a top face 35A of the insulation layer 35 and an upper end face 36A of the via wiring 36. The wiring structure 12 has: a plane layer 60 which has a plurality of through holes 60X which penetrate in a thickness direction and in which at least a part thereof is formed in a lattice shape in plan view and which is laminated on the insulation layer 35; and an insulation layer 51 which is laminated on the insulation layer 35 and fills the through holes 60X and covers the plane layer 60 and the wiring layer 50. A wiring density of the wiring structure 12 is higher than a wiring density of the wiring structure 11. Each through hole 60X is formed in a manner such that an opening width of an upper opening end is narrower than an opening width of a lower opening end. |
申请公布号 |
JP2015233085(A) |
申请公布日期 |
2015.12.24 |
申请号 |
JP20140119592 |
申请日期 |
2014.06.10 |
申请人 |
SHINKO ELECTRIC IND CO LTD |
发明人 |
SHIMIZU NORIYOSHI;OI ATSUSHI;SHIMIZU YUICHIRO |
分类号 |
H05K1/02;H01L23/12;H05K3/46 |
主分类号 |
H05K1/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|