| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a lithography apparatus which is advantageous to achieve uniformity in characteristic between a plurality of charged particle beams, even when the lithography apparatus is provided with an irradiation optical system having a nonuniform irradiation angle. <P>SOLUTION: A lithography apparatus comprises: an irradiation system (140) including a collimator lens; an aperture array (117) for dividing a charged particle beam emitted from the irradiation system into a plurality of charged particle beams; a convergence lens array (119) for forming a plurality of crossovers from the plurality of charged particle beams emitted from the aperture array; and a projection system (160) including a component (122) having a plurality of apertures corresponding to the plurality of crossovers and a plurality of projection units. In this lithography apparatus, the convergence lens array includes convergence lenses each decentering with respect to a corresponding aperture in the component, and the irradiation system includes adjustment means for adjusting an aberration so that each of positions of the plurality of crossovers formed by the convergence lens array while entering to the aperture array with an incident angle depending on the aberration is matched with a corresponding aperture in the component. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
