| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint device advantageous for reducing a positional displacement between a mold and a substrate.SOLUTION: The imprint device is configured to perform imprint processing for forming a pattern on a substrate by molding an imprint material on the substrate with a mold. The imprint device includes: a measuring part for measuring relative positions of the mold and the substrate; a light source part which radiates a light for hardening the imprint material; a scanning part which scans the light from the light source part on the substrate; and a control part which controls the imprint processing. The control part performs the imprint processing by making the scanning part scan the light while partially aligning the mold and the substrate on the basis of a measurement result of the measuring part. |
