| 摘要 |
A gas barrier film (10) that comprises a gas barrier layer (14), which is obtained by irradiating a layer that contains a polysilazane with vacuum ultraviolet light, on a base (11) is formed to contain a compound (A) that satisfies all of the conditions (a), (b) and (c) described below in an amount within the range from 1% by mass to 40% by mass (inclusive) relative to the total mass of the gas barrier layer. (a) The compound (A) has an Si-O bond and an organic group that is directly bonded to Si. (b) The compound (A) has an Si-H group or an Si-OH group. (c) The compound (A) has a molecular weight of from 90 to 1,200 (inclusive). |
