| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition capable of forming a hole pattern having an ultrafine pore diameter (for instance, 60 nm or smaller) excellent in circularity while maintaining low dependence on development time for the pore diameter, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device, and an electronic device using the same. <P>SOLUTION: There is provided an actinic ray sensitive or radiation sensitive resin composition including: (P) a resin having a repeating unit (a) represented by the following general formula (I); (B) a compound that generates an organic acid by irradiation with an actinic ray or radiation; and (C) a basic compound that has a nitrogen atom and is unchanged by irradiation with an actinic ray or radiation. A content of the compound (C) is 1.0 mass% or more based on the total solid content of the actinic ray sensitive or radiation sensitive resin composition. A molar ratio [C]/[B] of the compound (C) to the compound (B) is 0.40 or more. <P>COPYRIGHT: (C)2013,JPO&INPIT |
