| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning device capable of efficiently removing a foreign material attached to a substrate and suppressing the reattachment of a foreign material. <P>SOLUTION: The cleaning device includes: a processing chamber for processing a substrate; a support base that is provided in the processing chamber and supports the substrate; a gas injection mechanism that is provided in the processing chamber and injects gas to the substrate; and a temperature control mechanism that controls so that the temperature of the gas injected to the substrate is higher than the temperature of the inner wall of the processing chamber. A foreign material attached to the substrate is removed by the wind pressure of the gas injected from the gas injection mechanism. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
