发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an SGT having a structure that forms a transistor by a work function difference between a metal and a semiconductor.SOLUTION: A semiconductor device comprises: a columnar semiconductor that has an impurity concentration of 10cmor less; a first insulator that surrounds the columnar semiconductor; a first metal that surrounds the first insulator at one end of the columnar semiconductor; a second metal that surrounds the first insulator at the other one end of the columnar semiconductor; a third metal that surrounds the first insulator in a region sandwiched by the first metal and the second metal; a second insulator formed between the first metal and the third metal; a third insulator formed between the second metal and the third metal; a fourth metal that connects the first metal and the one end of the columnar semiconductor; and a fifth metal that connects the second metal and the other one end of the columnar semiconductor. A work function of the third metal is between 4.2 eV and 5.0 eV. |
申请公布号 |
JP2015233115(A) |
申请公布日期 |
2015.12.24 |
申请号 |
JP20140263130 |
申请日期 |
2014.12.25 |
申请人 |
UNISANTIS ELECTRONICS SINGAPORE PTE LTD |
发明人 |
MASUOKA FUJIO;NAKAMURA HIROKI |
分类号 |
H01L21/336;H01L29/423;H01L29/49;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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