SELF-ALIGNED INTERCONNECT WITH PROTECTION LAYER

摘要

An integrated circuit structure comprises: a first Inter-Layer Dielectric (ILD); a gate stack of the first ILD; a second ILD over the first ILD; a contact plug of the second ILD; and a dielectric protection layer, which is disposed on side surfaces facing the contact plug, coming in contact with the contact plug. The contact plug and the dielectric protection layer are in the second ILD. A dielectric capping layer comes in contact with the contact plug over the contact plug.