发明名称 METHOD FOR INSPECTING ELECTRON EMISSION UNIFORMITY OF ELECTRON EMITTERS IN LARGE-SIZED FIELD EMISSION DEVICE
摘要 The present invention relates to a method for testing whether electrons are uniformly emitted from a large-area field emission device including multiple gates or lenses which use nano-structure including CNT as an electron emission source, with the electron emission source arranged in multiple arrays on a cathode conductor, and which correspond to the electron emission source. For the same, the present invention includes: a step for scanning an electron beam to the electron emission source, with the electron emission source arranged on the cathode conductor; a step for detecting electrons of the scanned electron beam exiting the electron emission source after colliding with the electron emission source, or directly detecting the electrons of the scanned electron beam from the electron emission source; and a step for inspecting the uniformity of the amount of the detected electrons or inspecting the uniformity of the electron emission source by making an image derived from the detected electrons.
申请公布号 KR20150143382(A) 申请公布日期 2015.12.23
申请号 KR20150149592 申请日期 2015.10.27
申请人 CEBT CO., LTD. 发明人 KIM, HO SEOB
分类号 H01J9/42;H01J1/30 主分类号 H01J9/42
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