| 摘要 |
According to an aspect of the present invention, provided is a source deposition device comprising: a source case configured to contain a source, and spray the source onto a spray region; a heating line configured to heat the source case; and a sensor configured to measure an amount of spraying of the source in a location deviated from a concentration spraying region, where the source is concentrated, of the spraying region. According to the present invention, an accurate amount of the source deposited on a substrate is measured while durability of a sensor is increased. |
