发明名称 Photopolymer Composition for the Manufacturing of Holographic Media
摘要 <p>(Meth)-acrylate compound (I), is new. (Meth)-acrylate compound of formula (CH 2=C(R1)-C(=O)-A-N(R2)-C(=O)-X-R3) (I), is new. R1, R2 : H or organic residue; R3 : organic, optionally aromatic residue with 1-30C, which comprises up to 29 heteroatoms from O, N, S, Se, P or halo; A : optionally saturated, optionally branched and/or cyclic (C1-C6)-alkylthio, saturated, optionally saturated, optionally branched and/or cyclic (1-6C)-alkyloxy, polyethylene oxide or polypropylene oxide (preferably each with 2-6 monomer units in polymer chain (m is 2-6) is bonded via C on N); and X : O or N, which is optionally substituted with optionally branched (1-6C)-alkyl. An independent claim is also included for a photopolymer formulation comprising a matrix polymer, the writing monomer (I), and a photoinitiator.</p>
申请公布号 EP2354845(B1) 申请公布日期 2015.12.23
申请号 EP20100001008 申请日期 2010.02.02
申请人 COVESTRO DEUTSCHLAND AG 发明人 RÖLLE, THOMAS;BRUDER, FRIEDRICH-KARL;FÄCKE, THOMAS;WEISER, MARC-STEPHAN;HÖNEL, DENNIS
分类号 G03F7/00;C07C271/48;C07C275/28;C07C275/30;C07C323/20;C07C323/43;G03F7/027;G03H1/02 主分类号 G03F7/00
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