发明名称 Apparatus and methods relating to reduced photoelectron yield and/or secondary electron yield
摘要 A method of reducing the photoelectron yield (PEY) and/or the secondary electron yield (SEY) of at least part of an apparatus, the method comprising the steps of providing an apparatus, and ablating material from a metal surface of the apparatus using a pulsed laser to produce an array of periodic structures in the metal surface and thereby reducing the PEY and/or SEY of the metal surface. The apparatus is shown to be a vacuum chamber, a particle accelerator, a radio frequency waveguide, a detector and a spacecraft. Also shown is a method performed in the presence of a reactive gas such that the metal surface is caused to react with the reactive gas.
申请公布号 GB2527291(A) 申请公布日期 2015.12.23
申请号 GB20140010593 申请日期 2014.06.13
申请人 THE SCIENCE AND TECHNOLOGY FACILITIES COUNCIL 发明人 REZA VALIZADEH;OLEG MALYSHEV
分类号 B23K26/36;B23K26/00 主分类号 B23K26/36
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