Illumination system for a microlithographic projection exposure apparatus

摘要

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

主权项

1. An optical system, comprising:
a light source; an optical integrator comprising a plurality of first optical subelements, the optical integrator being configured to produce a plurality of secondary light sources each emitting a light bundle during use of the optical system; a condenser configured to effect a superposition of the light bundles in a field plane during use of the optical system; a first scattering structure comprising a plurality of second optical subelements, the first scattering structure being before the optical integrator in a light propagation direction of the optical system, each second optical subelement being configured to produce a substantially rectangular angular light distribution during use of the optical system; and a second scattering structure between the optical integrator and the condenser along the light propagation direction of the optical system, wherein the optical system is a micro lithographic illumination system.