LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention provides a lithography apparatus which forms a pattern by successively irradiating a beam to a first region and a second region of a substrate. The apparatus includes a beam detector which detects a beam, and a processor which allows a weighted value to the first location information of the second region based on the output from the beam detector before the irradiation of the beam of the first region, and allows a weighted value to the second location information of the second region based on the output from the beam detector after the irradiation, thereby obtaining the location information of the second region.