LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention provides a lithography apparatus which sequentially irradiates a beam to a first region and a second region having a common stitching region on a substrate in order to form a pattern on the substrate. The apparatus includes a processor configured to provide a weight value to first location information of the second region before the beam is irradiated to the first region and to the second location information of the second region after the irradiation individually in order to obtain location information of the second region.