发明名称 Photocurable compositions
摘要 A photocurable composition comprising a photoresist component, and a perfluoropolyether silane is disclosed. The composition enables easier release of phototool from a photoresist.
申请公布号 US9217920(B2) 申请公布日期 2015.12.22
申请号 US201314409162 申请日期 2013.08.06
申请人 3M Innovative Properties Company 发明人 Fall Douglas C.;Qiu Zai-Ming
分类号 G03F7/027;G03F7/075;G03F7/039;G03F7/20;C08G18/28;C08G18/79;B23K35/24;G03F7/004;H05K3/28;B23K35/36;B23K35/365;H05K3/34 主分类号 G03F7/027
代理机构 代理人 Kokko Kent S.
主权项 1. A photocurable composition comprising: a) a solder photoresist component, and b) a perfluoropolyether silane of the formula: (RPFPE—X1—CO—NH)x—R1—(NH—CO—X2—RSilyl)y,where RPFPE represents a perfluoropolyether group of the formula RPFPE*-Q where RPFPE* is a monovalent perfluoropolyether group, and Q is a divalent alkylene group, said alkylene optionally containing one or more catenary (in-chain) nitrogen or oxygen atoms, and optionally containing one or more sulfonamide, carboxamido, or carboxy functional groups, X1 and X2 are independently —O—, —S— or —NR2— where R2 is H or C1-C4 alkyl,R1 is a residue of a polyisocyanate,RSilyl is a silane group-containing moiety containing one or more silyl groups,subscripts x and y are each independently 1 to 6, and c) a free-radical photoinitiator.
地址 St. Paul MN US