HEAT TREATMENT APPARATUS FOR SUBSTRATE

摘要

The present invention relates to a heat treatment apparatus for a substrate thermally processing a substrate with a hot air. The present invention comprises: a chamber unit having a circulation passage wherein an air is introduced from an inlet and discharged to an outlet; a heating unit where a catalyst is attached to heat the air introduced to the chamber unit and come in contact with the air to remove foreign substances; a substrate support unit storing the substrate to thermally process the substrate with the heated air; and a hot air circulation unit enabling the air to circulate inside the chamber unit. Therefore, the present invention enables the heating unit where the catalyst is attached to be installed inside the chamber unit in order to enable the air circulating the circulation passage formed inside the chamber unit and the heating unit to come in contact with each other to remove the foreign substances contained in the air with a catalyst activity of the catalyst and heating of the heating unit.