Modification of nanoimprint lithography templates by atomic layer deposition

摘要

Methods of forming thin films on nanopatterning templates, such as nanoimprint lithography (NIL) templates are provided. In some embodiments, an atomic layer deposition (ALD) type process for modifying the surface of a NIL template comprises alternately and sequentially contacting a substrate in a reaction space with vapor phase pulses of two or more reactants.

主权项

1. A method for enhancing the ability of a patterned nanoimprint lithography (NIL) template to release from a cured imprint resist comprising growing a metallic thin film on the template by an atomic layer deposition (ALD) process, wherein the ALD process comprises alternately and sequentially contacting the template with a first reactant comprising a metal or semimetal and a second reactant, thereby forming the metallic thin film over the template, wherein the template is formed by patterning prior to growing the thin film on the template.