| 摘要 |
PROBLEM TO BE SOLVED: To save space of peripheral devices including a nozzle cleaning device.SOLUTION: A substrate processing device according to an embodiment comprises a nozzle, a movement mechanism, and a washing tank. The nozzle discharges a process liquid to a substrate. The movement mechanism moves the nozzle. The washing tank cleans the nozzle by immersing a cleaning liquid in the nozzle. The washing tank also comprises a storage region, a discharge passage, and a supply unit. The storage region stores the cleaning liquid. The discharge passage is provided in communication with the storage region, and discharges the cleaning liquid stored in the storage region. The supply unit is provided in the discharge passage, and supplies the amount of cleaning liquid exceeding the amount of cleaning liquid discharged from the discharge passage. |
