| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus which achieves both improvement of the transparency of a transparent conductive film, such as ITO, and resistance reduction.SOLUTION: A method of an annealing treatment of a transparent conductive film comprises generating water vapor by heating humidification water 16 by a first pressure container 11 for humidification, introducing the water vapor into a second pressure container 12 for annealing, heating the water vapor further in the second pressure container 12 at a temperature higher than the temperature of the inside of the first pressure container 11 to generate unsaturated steam of 100°C or higher so as to adjust the humidity and subjecting a transparent conductive film material in the second pressure container 12 to an annealing treatment at the adjusted humidity and a specified temperature in a prescribed time. |
