| 摘要 |
PROBLEM TO BE SOLVED: To provide a quaternary ammonium salt compound that suppresses reflection of a resist underlay film particularly in a KrF exposure process by adding the compound to a composition for forming a resist underlay film, compared to a conventional silicon-containing resist underlay film, and that improves a pattern profile.SOLUTION: The quaternary ammonium salt compound is represented by general formula (A-1) below. In the formula, R, R, and Rrepresent an alkyl group, an alkenyl group, an aryl group, or an aralkyl group, in which a part of or the whole hydrogen atoms may be replaced by a hydroxyl group, an alkoxy group, or a halogen atom, or may include at least one of a carbonyl group and an ester bond; Rrepresents a single bond, an alkylene group, an alkenylene group, an arylene group, or an aralkylene group, in which a part of or the whole hydrogen atoms may be replaced by an alkoxy group or a halogen atom, or may have at least one of an ether bond, a carbonyl group, an ester bond, and an amide bond; and Arepresents a non-nucleophilic counter ion. |
