发明名称 |
PEROXIDE-VAPOR TREATMENT FOR ENHANCING PHOTORESIST-STRIP PERFORMANCE AND MODIFYING ORGANIC FILMS |
摘要 |
Methods and apparatus for treating an organic film such as photoresist with a hydroxyl-generating compound prior to removing the organic film from a substrate are provided. Treatments include exposure to one or more of hydrogen peroxide vapor and water vapor in a non-plasma environment. In some implementations, conditions are such that condensation on the surface is suppressed. Methods include treating high-dose ion-implantation photoresists and post-plasma doping photoresists with little or no material loss and permit mild plasma removal of the photoresist after treatment. |
申请公布号 |
KR20150141906(A) |
申请公布日期 |
2015.12.21 |
申请号 |
KR20150081682 |
申请日期 |
2015.06.10 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
THEDJOISWORO BAYU ATMAJA;JACOBS BRADLEY JON;BERRY IVAN;CHEUNG DAVID |
分类号 |
H01L21/027;H01L21/47;H01L51/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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