| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device and a substrate processing unit in which maintenance work during substrate damage is facilitated.SOLUTION: A substrate processing device is provided including: substrate processing units (201A, 205A) which are provided in a housing (11) where an opening (50a) is formed at a part of a bottom surface (50) and which process a substrate (W); and a foreign matter capture part (60) which is connected to the opening (50a) and which catches foreign matter derived from the substrate (W). |
