| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask inspection device and a mask inspection method capable of the monitoring abnormal permeability and foreign matter defect of a mask in die-to-die comparison inspection.SOLUTION: In a mask inspection device, light from a light source is radiated onto the repeating region of a mask 1 and a transmission image by transmitted light collected by a transmission optical system and a reflection image by reflected light collected by a reflection optical system are input into a monitoring circuit 14. In the monitoring circuit 14, an inverted reflection image is generated that is a reflection image subjected to tone inversion and amplitude adjustment and a transmission reflection difference image is generated based on a difference between the inverted reflection image and the transmission image. Abnormality is determined by comparing a light volume monitoring point set at the transmission reflection difference image with a predetermined threshold. |
