发明名称 PROCESSING METHOD OF WAFER
摘要 PROBLEM TO BE SOLVED: To provide a processing method of a wafer capable of dividing a wafer appropriately while preventing pollution due to the adhesive layer of an adhesive tape.SOLUTION: A processing method of a wafer includes a tape sticking step for sticking a first adhesive tape (21) to the surface (11a) of a wafer (11), a groove formation step for forming a cutting groove (27) and a residual part (29) in the wafer by cutting a cutting blade (6) from the backside (11b) of the wafer along a division line (17), a re-sticking step for sticking a second adhesive tape (31) to the backside of the wafer and peeling the first adhesive tape from the wafer surface, and a division step for cutting the wafer surface with a cutting blade (14) along a division line, and dividing the wafer into device chips by cutting the residual part. The first adhesive tape is stuck to the wafer in a disposed adhesive layer (25) excepting the region corresponding to the device region (13) of the wafer.
申请公布号 JP2015228475(A) 申请公布日期 2015.12.17
申请号 JP20140114585 申请日期 2014.06.03
申请人 DISCO ABRASIVE SYST LTD 发明人 HATA AKIRA;YANG YUNFENG;SAKURAI TAKATOSHI;YAGIHARA JUN;KASUYA KENTA;KUBO ATSUSHI;BAO HONG
分类号 H01L21/301;B24B27/06 主分类号 H01L21/301
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