发明名称 Low-E Panels Utilizing High-Entropy Alloys and Combinatorial Methods and Systems for Developing the Same
摘要 Embodiments provided herein describe low-e panels utilizing high-entropy alloys (HEAs) and methods for forming such low-e panels, as well as combinatorial methods and systems for developing such low-e panels. A transparent substrate is provided. A reflective layer is formed above the transparent substrate. A metallic layer is formed above the transparent substrate. The metallic layer includes an HEA. The metallic layer, or any other component of the low-panels, may be formed using combinatorial processing.
申请公布号 US2015362473(A1) 申请公布日期 2015.12.17
申请号 US201414303277 申请日期 2014.06.12
申请人 Intermolecular Inc. 发明人 Anapolsky Abraham
分类号 G01N33/20 主分类号 G01N33/20
代理机构 代理人
主权项 1. A method for evaluating materials, the method comprising: providing a substrate, wherein the substrate has a plurality of site-isolated regions defined thereon; forming a first metallic material above a first of the plurality of site-isolated regions with a first set of processing conditions; forming a second metallic material above a second of the plurality of site-isolated regions with a second set of processing conditions; and characterizing the first metallic material and the second metallic material, wherein at least one of the first metallic material or the second metallic material comprises a high-entropy alloy, and wherein the second set of processing conditions is different than the first set of processing conditions.
地址 San Jose CA US