发明名称 |
Low-E Panels Utilizing High-Entropy Alloys and Combinatorial Methods and Systems for Developing the Same |
摘要 |
Embodiments provided herein describe low-e panels utilizing high-entropy alloys (HEAs) and methods for forming such low-e panels, as well as combinatorial methods and systems for developing such low-e panels. A transparent substrate is provided. A reflective layer is formed above the transparent substrate. A metallic layer is formed above the transparent substrate. The metallic layer includes an HEA. The metallic layer, or any other component of the low-panels, may be formed using combinatorial processing. |
申请公布号 |
US2015362473(A1) |
申请公布日期 |
2015.12.17 |
申请号 |
US201414303277 |
申请日期 |
2014.06.12 |
申请人 |
Intermolecular Inc. |
发明人 |
Anapolsky Abraham |
分类号 |
G01N33/20 |
主分类号 |
G01N33/20 |
代理机构 |
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代理人 |
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主权项 |
1. A method for evaluating materials, the method comprising:
providing a substrate, wherein the substrate has a plurality of site-isolated regions defined thereon; forming a first metallic material above a first of the plurality of site-isolated regions with a first set of processing conditions; forming a second metallic material above a second of the plurality of site-isolated regions with a second set of processing conditions; and characterizing the first metallic material and the second metallic material, wherein at least one of the first metallic material or the second metallic material comprises a high-entropy alloy, and wherein the second set of processing conditions is different than the first set of processing conditions. |
地址 |
San Jose CA US |